Open AccessFabrication of the Diffusion Barrier for Bus Electrode of Plasma Display by Electroless Ni-B Plating
Author(s) -
재응 최,
석준 홍,
희열 이,
성군 강
Publication year - 2003
Publication title -
korean journal of materials research
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.153
H-Index - 10
eISSN - 2287-7258
pISSN - 1225-0562
DOI - 10.3740/mrsk.2003.13.2.101
Subject(s) - materials science , electroplating , diffusion barrier , electrode , layer (electronics) , plating (geology) , amorphous solid , barrier layer , electroless plating , diffusion , microstructure , dielectric barrier discharge , metallurgy , chemical engineering , composite material , dielectric , optoelectronics , crystallography , chemistry , physics , geophysics , thermodynamics , geology , engineering
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