Open AccessGrowth and Characteristics of IrO2 Thin Films for Application as Bottom Electrodes of Ferroelectric Caplacitors
Author(s) -
재성 허,
훈상 최,
도영 김,
유민 장,
장혁 이,
인훈 최
Publication year - 2003
Publication title -
korean journal of materials research
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.153
H-Index - 10
eISSN - 2287-7258
pISSN - 1225-0562
DOI - 10.3740/mrsk.2003.13.2.069
Subject(s) - materials science , crystallinity , ferroelectricity , electrode , annealing (glass) , surface roughness , thin film , capacitor , surface finish , sputtering , composite material , optoelectronics , voltage , nanotechnology , electrical engineering , dielectric , chemistry , engineering
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