Open AccessGrowth and Characteristics of IrO2 Thin Films for Application as Bottom Electrodes of Ferroelectric Caplacitors
Author(s) -
Jae-Sung Hur,
Hoon-Sang Choi,
Doyoung Kim,
Yu-Min Jang,
Jang-Hyeok Lee,
In–Hoon Choi
Publication year - 2003
Publication title -
han'gug jaeryo haghoeji/han-guk jaeryo hakoeji
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.153
H-Index - 10
eISSN - 2287-7258
pISSN - 1225-0562
DOI - 10.3740/mrsk.2003.13.2.069
Subject(s) - materials science , crystallinity , ferroelectricity , electrode , annealing (glass) , surface roughness , thin film , capacitor , surface finish , sputtering , composite material , optoelectronics , voltage , nanotechnology , electrical engineering , dielectric , chemistry , engineering