Open AccessHigh Density Inductively Coupled Plasma Etching of InP in BCl3-Based Chemistries
Author(s) -
관식 조,
완태 임,
인규 백,
제원 이,
민현 전
Publication year - 2003
Publication title -
korean journal of materials research
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.153
H-Index - 10
eISSN - 2287-7258
pISSN - 1225-0562
DOI - 10.3740/mrsk.2003.13.12.775
Subject(s) - etching (microfabrication) , inductively coupled plasma , materials science , chamber pressure , plasma , planar , reactive ion etching , power density , surface roughness , plasma etching , analytical chemistry (journal) , rf power amplifier , optoelectronics , power (physics) , nanotechnology , layer (electronics) , chemistry , composite material , metallurgy , physics , chromatography , amplifier , computer graphics (images) , cmos , quantum mechanics , computer science
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