Open AccessTHE MODULAR PRINCIPLE OF VACUUM-PLASMA EQUIPMENT DESIGN FOR PLASMA ETCHING SYSTEM FOR MICROELECTRONICS
Author(s) -
V. V. Odinokov,
В. В. Панін
Publication year - 2019
Publication title -
èlektronnaâ tehnika. seriâ 2. poluprovodnikovye pribory
Language(s) - English
Resource type - Journals
ISSN - 2073-8250
DOI - 10.36845/2073-8250-2019-254-3-48-56
Subject(s) - microelectronics , modular design , plasma , plasma etching , etching (microfabrication) , materials science , engineering , nanotechnology , computer science , physics , nuclear physics , programming language , layer (electronics)