Open AccessSTRUCTURAL AND ELECTROCHEMICAL PROPERTIES OF CHEMICALLY DEPOSITED COPPER DOPED NICKEL HYDROXIDE
Author(s) -
D. B. Mane,
L.D. Kadam,
R. V. Dhekale,
G. M. Lohar
Publication year - 2021
Publication title -
paripex-indian journal of research
Language(s) - English
Resource type - Journals
ISSN - 2250-1991
DOI - 10.36106/paripex/2709013
Subject(s) - materials science , capacitance , electrode , nickel , copper , electrochemistry , dopant , doping , hydroxide , chemical engineering , horizontal scan rate , metallurgy , inorganic chemistry , cyclic voltammetry , chemistry , optoelectronics , engineering
Present work reported, copper doped Ni(OH) deposited successfully by chemical bath deposition method on 2economical stainless steel electrode. The XRD analysis represent hexagonal crystal structure and presence of Ni and Cuconfirm by FT-IR study. The surface morphology studied by SEM indicates nanopetals linked marigold like microflowers.-1 -1 The 0.2% Cu doped Ni(OH)2 shows specific capacitance 715 Fg at scan rate 10 mV s . EIS study interprets that electrodeN-0.2% have least charge transfer resistance which improve value of specific capacitance. All results revels cupper isgood dopant for improve the specific capacitance.
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