Open AccessStrained SI/SIGE/SI Nano-Channel Hoi Mosfet
Publication year - 2019
Publication title -
international journal of recent technology and engineering
Language(s) - English
Resource type - Journals
ISSN - 2277-3878
DOI - 10.35940/ijrte.b1229.0782s319
Subject(s) - mosfet , materials science , optoelectronics , strained silicon , silicon , threshold voltage , velocity overshoot , channel (broadcasting) , electron mobility , germanium , channel length modulation , short channel effect , electrical engineering , nanotechnology , voltage , transistor , crystalline silicon , amorphous silicon , engineering , electron , physics , quantum mechanics
Strained Si technology has headed in the development of single or dual channel strained silicon MOSFETs devices. Comprehending the need of advancement in recent technologies with miniaturized features, developing a novel MOSFET on ultrathin double strained Si with strained SiGe sandwiched in between and forming a tri-channel MOSFET has been the crux of this present research. Incorporation of quantum carrier confinement effect on the ultrathin dual strained Si layers in the channel has been implemented to counterbalance the threshold voltage roll-off induced by the strained layers. A comparison of the conventional strained silicon on relaxed silicon-germanium with double strained silicon channel MOSFET has been perceived leading to eloquent drain current enhancement of ~49% with a small reduction in the threshold voltage caused by the additional bottom strained Si layer. Further, 100nm and 50nm channel length have been compared and a superior device characteristic for the reduced device dimension is attained as the prominence of velocity overshoot is more in short channel device approaching to quasi-ballistic transport in the channel region