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Constrained Local Models (CLM) For Facial Feature Extraction using CLNF and SVR as Patch Experts
Author(s) -
Ayah Alsarayreh,
Fatma Susilawati Mohamad
Publication year - 2020
Publication title -
international journal of recent technology and engineering
Language(s) - English
Resource type - Journals
ISSN - 2277-3878
DOI - 10.35940/ijrte.a2766.079220
Subject(s) - computer science , margin (machine learning) , artificial intelligence , feature (linguistics) , pattern recognition (psychology) , feature extraction , face (sociological concept) , field (mathematics) , support vector machine , machine learning , mathematics , social science , philosophy , linguistics , sociology , pure mathematics
Methods for detection of facial characteristics have again developed greatly in recent times. However, they also argue in the presence of poor lighting conditions for amazing pose or occlusions. A well-established group of strategies for facial feature extraction is the Constrained Local Model (CLM). Recently, they are bringing cascaded regression-built methodologies out of favor. This is because the failure of presenting nearby CLM detectors to model the highly complex special signature look affected to a small degree by voice, illumination, facial hair and make-up. This paper keeps tabs on execution to collect facial features for the Constrained Local Model (CLM). CLM model relies on patch model to collect facial image demand features. In this paper patch model built using Support Vector Regression (SVR) and Constrained Local Neural Field (CLNF). We show that the CLNF model exceeds SVR by a large margin on the LFPW database to identify facial landmarks.

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