Open AccessHigh efficiency focusing double-etched SiN grating coupler for trapped ion qubit manipulation
Author(s) -
Mizuki Shirao,
Daniel Klawson,
Sara Mouradian,
M.C. Wu
Publication year - 2022
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.35848/1347-4065/ac5b27
Subject(s) - grating , electron beam lithography , fabrication , qubit , optics , lithography , materials science , optoelectronics , monte carlo method , ion , inverse , physics , nanotechnology , resist , medicine , alternative medicine , layer (electronics) , pathology , quantum mechanics , quantum , statistics , mathematics , geometry
A one-dimensional focusing grating coupler array based in silicon nitride (SiN) was proposed for trapped ion qubit manipulation. By applying inverse design optimization with a double-etched grating structure, a directionality of 98% was achieved. A small beam diameter of 2.5 µm on the target ion with a low crosstalk of -36 dB was attained. Additionally, the impact of fabrication errors was investigated through a Monte Carlo simulation; within the accuracy of an electron beam lithography-based process, the output efficiency was maintained at 93%