z-logo
open-access-imgOpen Access
Ion-induced interface defects in a-Si:H/c-Si heterojunction: possible roles and kinetics of hot mobile hydrogens
Author(s) -
Shota Nunomura,
Takayoshi Tsutsumi,
Kazuya Nakane,
Aiko Sato,
Isao Sakata,
Masaru Hori
Publication year - 2022
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.35848/1347-4065/ac5210
Subject(s) - dangling bond , heterojunction , materials science , silicon , diffusion , amorphous solid , ion , etching (microfabrication) , deposition (geology) , amorphous silicon , optoelectronics , crystalline silicon , crystallography , chemistry , nanotechnology , layer (electronics) , thermodynamics , organic chemistry , biology , physics , paleontology , sediment

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom