Open AccessPropiedades ópticas y estructurales de las películas de óxido de silicio rico en silicio obtenidas por la técnica HFCVD
Author(s) -
Nora Castillo-Tépox,
José Alberto Luna López,
José Álvaro David Hernández de la Luz,
Karim Monfil Leyva
Publication year - 2019
Publication title -
revista de simulación y laboratorio
Language(s) - Spanish
Resource type - Journals
ISSN - 2410-3462
DOI - 10.35429/jsl.2019.20.6.9.14
Subject(s) - thin film , materials science , chemical vapor deposition , annealing (glass) , fourier transform infrared spectroscopy , transmittance , photoluminescence , silicon , substrate (aquarium) , band gap , analytical chemistry (journal) , optics , optoelectronics , chemistry , nanotechnology , composite material , physics , oceanography , chromatography , geology
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