Open AccessThin-films microstructuration through photolithography
Author(s) -
Joel Isaac Alvarado-López,
Adriana Inclan-Ladino,
Ricardo Téllez-Limón,
Rubén López-Villegas
Publication year - 2019
Publication title -
journal-taiwan
Language(s) - Uncategorized
Resource type - Journals
ISSN - 2524-2121
DOI - 10.35429/ejt.2019.6.3.7.10
Subject(s) - photolithography , photoresist , materials science , nanotechnology , lithography , plasmon , thin film , metamaterial , optoelectronics , characterization (materials science) , optics , layer (electronics) , physics