Open AccessThree-dimensional, tapered nanoelectrodes on CMOS electronics for an intracellular contact
Author(s) -
Sonja Allani,
Andreas Jupe,
Amin Rustom,
Holger Kappert,
H. Vogt
Publication year - 2018
Publication title -
frontiers in cellular neuroscience
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.877
H-Index - 86
ISSN - 1662-5102
DOI - 10.3389/conf.fncel.2018.38.00108
Subject(s) - cmos , materials science , optoelectronics , deep reactive ion etching , wafer , lithography , chip , nanotechnology , dry etching , etching (microfabrication) , electrical engineering , reactive ion etching , layer (electronics) , engineering