Open AccessAUTOMATED DEPOSITION OF AMORPHOUS CHALCOGENIDE LAYERS
Author(s) -
Valery I. Nalivaiko,
М. А. Пономарева
Publication year - 2019
Publication title -
interèkspo geo-sibirʹ
Language(s) - English
Resource type - Journals
ISSN - 2618-981X
DOI - 10.33764/2618-981x-2019-8-64-68
Subject(s) - chalcogenide , deposition (geology) , materials science , evaporator , amorphous solid , layer (electronics) , refractive index , substrate (aquarium) , optics , vapour deposition , composite material , optoelectronics , thin film , mechanical engineering , nanotechnology , engineering , geology , paleontology , chemistry , oceanography , physics , heat exchanger , organic chemistry , sediment
The results of the application of automation in obtaining chalcogenide layers with new properties are given. Such parameters of the thermal vapour deposition process as evaporator temperature or power were automatically controlled. The moments of the opening and closing of the valve were established experimentally in order to ensure a uniform deposition rate of the layers. The criterion for evaluating the uniform speed was the data of optical control of the thickness of the applied layers. As an example, diagrams of the behavior of the evaporator temperature are given, which are set using a control program and implemented in real time. As a result, layers with reproducible parameters and doubled dynamic range of photo-structural changes in the refractive index were obtained. Automated technology is applied for deposition with uniform speed of film axicons on rotating substrates through a mask of a special shape, providing a linear radial change in layer thickness.