Open AccessOPTIMIZATION OF OPTICAL CHANNEL OF SCANNING LASER NANOLITHOGRAPHER FOR WRITING ON PHOTO- AND THERMO-SENSITIVE MATERIALS
Author(s) -
V. P. Korolkov,
Andrey G. Sedukhin,
Anton Kachkin,
Andrey Elisafenko
Publication year - 2019
Publication title -
interèkspo geo-sibirʹ
Language(s) - English
Resource type - Journals
ISSN - 2618-981X
DOI - 10.33764/2618-981x-2019-8-28-33
Subject(s) - laser , materials science , optics , planar , collimated light , diffraction , optoelectronics , line (geometry) , laser scanning , channel (broadcasting) , laser beams , computer science , physics , computer graphics (images) , telecommunications , geometry , mathematics
New units and modified constructional components of an optical channel of a scanning X-Y laser nanolithographer are described. The nanolithographer serves for direct laser writing of subwavelength diffractive structures on thin-film photo- and thermo-sensitive materials deposited on planar transparent glass substrates. Significant changes were introduced into a unit of spatial frequency filtration, expansion and collimation of the laser beam of a writing laser. A new unit for on-line in-situ inspection of written diffractive structure is a unit of backward incoherent illumination.