Open AccessRESEARCH OF FORMATION PROCESS OF SUBMICRON ELEMENTS OF OPTOELECTRONIC DEVICES CONSIDERING INFORMATION PROTECTION REQUIREMENTS
Author(s) -
Anatoly Ilchenko,
Igor N. Karmanov
Publication year - 2019
Publication title -
interèkspo geo-sibirʹ
Language(s) - English
Resource type - Journals
ISSN - 2618-981X
DOI - 10.33764/2618-981x-2019-6-1-108-114
Subject(s) - process (computing) , layer (electronics) , chip , production (economics) , computer science , substitution (logic) , materials science , optoelectronics , engineering physics , nanotechnology , embedded system , process engineering , engineering , electrical engineering , operating system , economics , macroeconomics , programming language
In this paper, the term «hardware tab» is reviewed, critical stages of chip production on which tabs can occur are indicated, the possible consequences of tab activation are described. Also a method is described that does not allow the appearance of tabs, as an example of import substitution. The developed technological mode of submicron elements obtaining is shown, by the example of a polysilicon layer.