Open AccessPreparation of Polymeric films containing Schiff base as UV-Absorber with Good Resistance against UV-Photoaging
Publication year - 2021
Publication title -
biointerface research in applied chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.216
H-Index - 11
ISSN - 2069-5837
DOI - 10.33263/briac115.1274312749
Subject(s) - polystyrene , schiff base , materials science , stabilizer (aeronautics) , ultraviolet , polymer , photoaging , polymer chemistry , ultraviolet light , scanning electron microscope , photochemistry , chemistry , composite material , optoelectronics , mechanical engineering , biology , engineering , genetics
To increase the photostability of polystyrene, a new Schiff base has been added to the polystyrene mixture. The polystyrene films have been exposed to ultraviolet light for 300 hours. Schiff's base has been utilized as a long-term polystyrene optical stabilizer against ultraviolet radiation. Schiff base efficiency is widely recognized for using different techniques, including weight loss determinations, infrared spectroscopy, and electron microscopy (SEM) of PS films after 300 hours of irradiation. Polystyrene/Schiff base blend surface morphology was investigated by SEM technique, and the images demonstrated the formation of terrestrial crack materials due to the presence of photo-stabilizer within the polymer materials. Moreover, the carbonyl group indices were much lower for PS/stabilizer blend than for the blank polymer. The results showed that adding a Schiff base greatly improved the photostability of polystyrene. Furthermore, many unwanted alternations because of the exposure to ultraviolet light were treated by adding the Schiff base compared to the blank polymeric film. The photo-stabilizer absorbs the light and works as a free radical scavenger segment.