z-logo
open-access-imgOpen Access
Modeling of Static Negative Bias Temperature Stressing in p-channel VDMOSFETs using Least Square Method
Author(s) -
Nikola Mitrović,
Danijel Danković,
Branislav Ranđelović,
Zoran Prijić,
N. Stojadinović
Publication year - 2020
Publication title -
informacije midem - journal of microelectronics electronic components and materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.122
H-Index - 18
eISSN - 1855-4709
pISSN - 0352-9045
DOI - 10.33180/infmidem2020.305
Subject(s) - negative bias temperature instability , threshold voltage , materials science , electronic circuit , square (algebra) , voltage , channel (broadcasting) , stress (linguistics) , biasing , oxide , power (physics) , equivalent circuit , condensed matter physics , electronic engineering , electrical engineering , physics , thermodynamics , engineering , mathematics , transistor , linguistics , philosophy , geometry , metallurgy

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom