Open AccessImprovement of Environment Stability of an i-Line Chemically Amplified Photoresist
Author(s) -
Haibo Li,
Kempur Microelectronics,
Qian Yang,
Jia Sun,
Jie Li,
Meng Guo,
Bing Li
Publication year - 2021
Publication title -
journal of microelectronic manufacturing
Language(s) - English
Resource type - Journals
ISSN - 2578-3769
DOI - 10.33079/jomm.21040201
Subject(s) - photoresist , line (geometry) , materials science , nanotechnology , mathematics , geometry , layer (electronics)