Open AccessFast and Robust DCNN Based Lithography SEM Image Contour Extraction Models
Author(s) -
Tao Zhou,
Xuelong Shi,
Chen Li,
Yan Yan,
Bowen Xu,
Shoumian Chen,
Yuhang Zhao,
Wenzhan Zhou,
Kan Zhou,
Xuan Zeng
Publication year - 2021
Publication title -
journal of microelectronic manufacturing
Language(s) - English
Resource type - Journals
ISSN - 2578-3769
DOI - 10.33079/jomm.21040102
Subject(s) - lithography , artificial intelligence , computer vision , extraction (chemistry) , image (mathematics) , computer science , pattern recognition (psychology) , materials science , physics , optics , chemistry , chromatography