Open AccessFast and Accurate Machine Learning Inverse Lithography Using Physics Based Feature Maps and Specially Designed DCNN
Author(s) -
Xuelong Shi,
Yan Yan,
Tao Zhou,
Xueru Yu,
Chen Li,
Shoumian Chen,
Yuhang Zhao
Publication year - 2020
Publication title -
journal of microelectronic manufacturing
Language(s) - English
Resource type - Journals
ISSN - 2578-3769
DOI - 10.33079/jomm.20030407
Subject(s) - feature (linguistics) , lithography , inverse , computer science , artificial intelligence , engineering drawing , nanotechnology , physics , engineering , materials science , mathematics , optics , geometry , philosophy , linguistics