Open AccessA Photolithography Process Design for 5 nm Logic Process Flow
Author(s) -
Qiang Wu,
Yanli Li,
Yushu Yang,
Yuhang Zhao
Publication year - 2019
Publication title -
journal of microelectronic manufacturing
Language(s) - English
Resource type - Journals
ISSN - 2578-3769
DOI - 10.33079/jomm.19020408
Subject(s) - photolithography , process (computing) , computer science , process engineering , materials science , nanotechnology , engineering , programming language