Open AccessA Simulation Study for Typical Design Rule Patterns in 5 nm Logic Process with EUV Photolithographic Process
Author(s) -
Yanli Li,
Qiang Wu,
Shoumian Chen
Publication year - 2019
Publication title -
journal of microelectronic manufacturing
Language(s) - English
Resource type - Journals
ISSN - 2578-3769
DOI - 10.33079/jomm.19020406
Subject(s) - extreme ultraviolet lithography , process (computing) , computer science , process engineering , materials science , engineering , optoelectronics , programming language
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