Open AccessDevelopment and Prospect of Process Models and Simulation Methods for Atomic Layer Deposition
Author(s) -
Lei Qu,
Rui Chen,
Xiaoting Li,
Houcheng Zhang,
Yanrong Wang,
Shuhua Wei,
Yan Jiang,
Yayi Wei
Publication year - 2019
Publication title -
journal of microelectronic manufacturing
Language(s) - English
Resource type - Journals
ISSN - 2578-3769
DOI - 10.33079/jomm.19020204
Subject(s) - deposition (geology) , atomic layer deposition , layer (electronics) , process (computing) , materials science , nanotechnology , computer science , engineering physics , engineering , geology , paleontology , sediment , operating system