Open AccessVariational Level-set Formulation for Lithographic Source and Mask Optimization Generalized Euler'Constant Family
Author(s) -
Yongming Shen,
Zhenrong Zhang
Publication year - 2018
Publication title -
journal of microelectronic manufacturing
Language(s) - English
Resource type - Journals
ISSN - 2578-3769
DOI - 10.33079/jomm.18010203
Subject(s) - constant (computer programming) , euler's formula , set (abstract data type) , mathematics , lithography , mathematical analysis , mathematical optimization , computer science , physics , programming language , optics