Analytical Electron Microscopy of Silicon Nitride Nanostructures Synthesized from the Vapor Phase
Author(s) -
Mariella Cortez Caillahua,
F. Moura,
G. Solórzano
Publication year - 2019
Publication title -
journal of nanotechnology
Language(s) - English
Resource type - Journals
ISSN - 2522-6908
DOI - 10.32829/nanoj.v3i1.87
Subject(s) - materials science , silicon nitride , nitride , chemical engineering , corrosion , chemical vapor deposition , amorphous solid , silicon , phase (matter) , semiconductor , ceramic , nanotechnology , composite material , metallurgy , optoelectronics , crystallography , organic chemistry , chemistry , layer (electronics) , engineering
Silicon nitride, Si3N4 is a covalent compound with excellent physical and chemical properties such as corrosion resistance, low-specific weight and good thermal conductivity at ambient and elevated temperatures. Such properties are very attractive in application as advanced ceramics and in semiconductor devise [1]. Nano sized amorphous silicon nitride powders were synthesized at 300 °C by precipitation from the vapor phase reaction of SiCl4 and NH3 and Ar as carrier gas. Solid ammonium halogenide is formed as by-product, in addition to silicon nitride powder.
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