
Modeling of Monomer Pressure Evolution in an Inductively Coupled pulsed plasma deposition of aniline
Author(s) -
Ashish Kumar Shukla,
Rajendra Kumar
Publication year - 2019
Publication title -
international journal of research in advent technology
Language(s) - English
Resource type - Journals
ISSN - 2321-9637
DOI - 10.32622/ijrat.76201961
Subject(s) - aniline , plasma , inductively coupled plasma , monomer , deposition (geology) , materials science , inductively coupled plasma mass spectrometry , analytical chemistry (journal) , chemistry , environmental chemistry , chromatography , polymer , organic chemistry , mass spectrometry , physics , geology , composite material , nuclear physics , paleontology , sediment