Open AccessMonosilane SiH4 plasma kinetics generated by e-beam and electrons’ energy distribution impact on silicon chemical vapor deposition
Author(s) -
S. K. Kunakov,
A. Imash
Publication year - 2021
Publication title -
l.n. gumilev atyndaġy euraziâ u̇lttyk̦ universitetìnìn̦ habaršysy. fizika, astronomiâ seriâsy
Language(s) - English
Resource type - Journals
eISSN - 2663-1296
pISSN - 2616-6836
DOI - 10.32523/2616-6836-2021-135-2-57-68
Subject(s) - chemical vapor deposition , plasma enhanced chemical vapor deposition , silicon , electron beam physical vapor deposition , plasma , deposition (geology) , materials science , kinetics , plasma processing , atomic physics , cathode ray , electron , analytical chemistry (journal) , chemistry , optoelectronics , physics , nuclear physics , environmental chemistry , paleontology , quantum mechanics , sediment , biology