Open AccessFabrication of titanium nitride thin films by DC magnetron sputtering on different types of subtrates for coating applications
Author(s) -
Vo Tran Tuyet Thuong,
Dao Anh Tuan,
Cu Thi Thu Hang,
Le Vu Tuan Hung
Publication year - 2014
Publication title -
khoa học công nghệ
Language(s) - English
Resource type - Journals
ISSN - 1859-0128
DOI - 10.32508/stdj.v17i4.1557
Subject(s) - materials science , thin film , sputter deposition , sputtering , titanium nitride , tin , nitride , substrate (aquarium) , titanium , coating , composite material , scanning electron microscope , optoelectronics , metallurgy , layer (electronics) , nanotechnology , oceanography , geology
Titanium nitride thin films (TiN) are fabricated by DC magnetron sputtering on different types of substrates such as glass substrates, PET substrates, substrate alloy (AISI 304) and drill steel. In this work we study the effect of distance target - substrate, sputtering time and negative voltage to the crystal structure, mechanical properties and optical films. The properties of thin films were studied by X-ray diffraction method Stylus, UV – Vis method and scanning electron microscopy. Results showed that the distance target - substrate, sputtering time and negative voltage affects the crystalline structure, mechanical properties and optical films. TiN films have been synthesized highly crystalline structure, crystal structure of thin films oriented along the the surface lattice (111), (200) and (311). Besides TiN thin films also have high reflectance in the visible and infrared range, good adhesion, high chemical durability.