Fabrication of titanium nitride thin films by DC magnetron sputtering on different types of subtrates for coating applications | Zendy

Thuong Tran Tuyet Vo | Zendy; Tuấn Anh Đào | Zendy; Hang Thi Thu Cu | Zendy; Hung Vu Tuan Le | Zendy

Open Access

Fabrication of titanium nitride thin films by DC magnetron sputtering on different types of subtrates for coating applications

Author(s) -

Thuong Tran Tuyet Vo,

Tuấn Anh Đào,

Hang Thi Thu Cu,

Hung Vu Tuan Le

Publication year - 2014

Publication title -

science and technology development journal

Language(s) - English

Resource type - Journals

ISSN - 1859-0128

DOI - 10.32508/stdj.v17i4.1557

Subject(s) - materials science , thin film , sputter deposition , sputtering , titanium nitride , tin , nitride , substrate (aquarium) , titanium , coating , composite material , scanning electron microscope , optoelectronics , metallurgy , layer (electronics) , nanotechnology , oceanography , geology

Titanium nitride thin films (TiN) are fabricated by DC magnetron sputtering on different types of substrates such as glass substrates, PET substrates, substrate alloy (AISI 304) and drill steel. In this work we study the effect of distance target - substrate, sputtering time and negative voltage to the crystal structure, mechanical properties and optical films. The properties of thin films were studied by X-ray diffraction method Stylus, UV – Vis method and scanning electron microscopy. Results showed that the distance target - substrate, sputtering time and negative voltage affects the crystalline structure, mechanical properties and optical films. TiN films have been synthesized highly crystalline structure, crystal structure of thin films oriented along the the surface lattice (111), (200) and (311). Besides TiN thin films also have high reflectance in the visible and infrared range, good adhesion, high chemical durability.

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