Open AccessReactive ion etching of SiO₂ using CHF₃/CO₂ gas mixture
Author(s) -
Anthony Hyunwoo Chung
Publication year - 2019
Language(s) - English
Resource type - Dissertations/theses
DOI - 10.31979/etd.srn6-ayg2
Subject(s) - reactive ion etching , etching (microfabrication) , materials science , chemical engineering , composite material , engineering , layer (electronics)