Open AccessReactive ion etching of SiO₂ using CHF₃/CO₂ gas mixture
Author(s) -
Anthony Hyunwoo Chung
Publication year - 1997
Language(s) - English
Resource type - Dissertations/theses
DOI - 10.31979/etd.srn6-ayg2
Subject(s) - reactive ion etching , etching (microfabrication) , materials science , ion , chemical engineering , chemistry , nanotechnology , engineering , organic chemistry , layer (electronics)
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