Open AccessCharacterization of 157 nm photoresist materials for advanced lithographic processess
Author(s) -
Nasim Gholizadeh
Publication year - 2019
Language(s) - English
Resource type - Dissertations/theses
DOI - 10.31979/etd.jeg2-9dx6
Subject(s) - photoresist , characterization (materials science) , lithography , materials science , nanotechnology , optoelectronics , layer (electronics)