Open AccessChemical vapor deposition of polycrystalline silicon in a rapid thermal processor
Author(s) -
Jimmy C Liao
Publication year - 1992
Language(s) - English
Resource type - Dissertations/theses
DOI - 10.31979/etd.86t7-2d3h
Subject(s) - polycrystalline silicon , chemical vapor deposition , materials science , silicon , thermal , combustion chemical vapor deposition , deposition (geology) , crystallite , chemical engineering , engineering physics , optoelectronics , nanotechnology , thin film , engineering , metallurgy , physics , geology , carbon film , thin film transistor , thermodynamics , paleontology , layer (electronics) , sediment
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