Open AccessChemical vapor deposition of polycrystalline silicon in a rapid thermal processor
Author(s) -
Jimmy C Liao
Publication year - 2019
Language(s) - English
Resource type - Dissertations/theses
DOI - 10.31979/etd.86t7-2d3h
Subject(s) - chemical vapor deposition , polycrystalline silicon , materials science , silicon , thermal , combustion chemical vapor deposition , deposition (geology) , crystallite , optoelectronics , engineering physics , chemical engineering , nanotechnology , thin film , engineering , metallurgy , physics , carbon film , geology , thin film transistor , thermodynamics , paleontology , layer (electronics) , sediment