Open AccessENGINEERING HIGH-SPEED, ULTRA-SMOOTH REACTIVE PHASE GLASS ETCHING IN AN INDUCTIVELY COUPLED PLASMA
Author(s) -
C. Zhang,
Gokhan Hatipoglu,
Srinivas Tadigadapa
Publication year - 2014
Publication title -
2014 solid-state, actuators, and microsystems workshop technical digest
Language(s) - Uncategorized
Resource type - Conference proceedings
DOI - 10.31438/trf.hh2014.53
Subject(s) - inductively coupled plasma , etching (microfabrication) , plasma , reactive ion etching , materials science , phase (matter) , plasma etching , optoelectronics , composite material , chemistry , physics , organic chemistry , layer (electronics) , quantum mechanics