Open AccessENGINEERING HIGH-SPEED, ULTRA-SMOOTH REACTIVE PHASE GLASS ETCHING IN AN INDUCTIVELY COUPLED PLASMA
Author(s) -
C. Zhang,
Gokhan Hatipoglu,
Srinivas Tadigadapa
Publication year - 2014
Publication title -
1998 solid-state, actuators, and microsystems workshop technical digest
Language(s) - Uncategorized
Resource type - Conference proceedings
DOI - 10.31438/trf.hh2014.53
Subject(s) - reactive ion etching , inductively coupled plasma , etching (microfabrication) , borosilicate glass , materials science , plasma , plasma etching , analytical chemistry (journal) , quartz , isotropic etching , dry etching , dissociation (chemistry) , optoelectronics , nanotechnology , composite material , chemistry , chromatography , layer (electronics) , physics , quantum mechanics
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