Open AccessCHARACTERIZATION AND PRODUCTION CONTROL FOR DRIE OF MEMS ACCELEROMETERS USING OPTICAL DISPLACEMENT TRANSDUCER MEASUREMENTS
Author(s) -
B. Keese,
Brian Homeijer,
J.L. Williams,
P. Knutrud
Publication year - 2012
Publication title -
1998 solid-state, actuators, and microsystems workshop technical digest
Language(s) - English
Resource type - Conference proceedings
DOI - 10.31438/trf.hh2012.71
Subject(s) - microelectromechanical systems , accelerometer , transducer , deep reactive ion etching , metrology , displacement (psychology) , materials science , acoustics , etching (microfabrication) , interferometry , electronic engineering , computer science , optoelectronics , engineering , optics , nanotechnology , physics , reactive ion etching , psychology , layer (electronics) , psychotherapist , operating system
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