Open AccessELECTRICAL CHARACTERIZATION OF PECVD SILICON CARBIDE FOR APPLICATION IN MEMS VAPOR HF SACRIFICIAL RELEASE
Author(s) -
L. Chen,
T. Lee,
Charles Regan,
Firas Sammoura,
Christine H. Tsau,
Mehran Mehregany,
K. Nunan,
Kaiwen Yang
Publication year - 2010
Publication title -
2010 solid-state, actuators, and microsystems workshop technical digest
Language(s) - English
Resource type - Conference proceedings
DOI - 10.31438/trf.hh2010.86
Subject(s) - plasma enhanced chemical vapor deposition , silicon carbide , microelectromechanical systems , characterization (materials science) , materials science , silicon , chemical vapor deposition , optoelectronics , nanotechnology , composite material