
CHARACTERIZATION OF THE COMPLETE STRESS STATE IN THIN FILM CMOS LAYERED MATERIALS
Author(s) -
Fabio Fachin,
Varghese Mathai,
S.A. Nikles,
Brian L. Wardle
Publication year - 2010
Publication title -
2010 solid-state, actuators, and microsystems workshop technical digest
Language(s) - English
Resource type - Conference proceedings
DOI - 10.31438/trf.hh2010.84
Subject(s) - characterization (materials science) , stress (linguistics) , cmos , materials science , thin film , state (computer science) , optoelectronics , computer science , nanotechnology , philosophy , linguistics , algorithm