Open AccessATOMIC LAYER DEPOSITED ALUMINA FOR USE AS AN ETCH BARRIER AGAINST XENON DIFLUORIDE ETCHING
Author(s) -
Gabriel L. Smith,
Ronald G. Polcawich,
Jeffrey S. Pulskamp,
T. Waggoner,
John F. Conley
Publication year - 2010
Publication title -
2010 solid-state, actuators, and microsystems workshop technical digest
Language(s) - English
Resource type - Conference proceedings
DOI - 10.31438/trf.hh2010.52
Subject(s) - xenon difluoride , etching (microfabrication) , xenon , layer (electronics) , atomic layer deposition , materials science , barrier layer , chemical engineering , composite material , chemistry , inorganic chemistry , organic chemistry , engineering