Open AccessLOW-TEMPERATURE (<300ºC) LOW-STRESS SILICON CARBIDE SURFACE MICROMACHINING FABRICATION TECHNOLOGY
Author(s) -
Frédéric Nabki,
Tomas A. Dusatko,
Srikar Vengallatore,
Mourad N. El-Gamal
Publication year - 2008
Publication title -
1998 solid-state, actuators, and microsystems workshop technical digest
Language(s) - Uncategorized
Resource type - Conference proceedings
DOI - 10.31438/trf.hh2008.57
Subject(s) - materials science , silicon carbide , fabrication , optoelectronics , surface micromachining , etching (microfabrication) , silicon , isotropic etching , microelectromechanical systems , sputtering , amorphous solid , layer (electronics) , composite material , thin film , nanotechnology , crystallography , medicine , alternative medicine , pathology , chemistry
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