Open AccessHIGH SPEED DRY ANISOTROPIC ETCHING OF GLASS AND PIEZOCERAMICS FOR MICROSYSTEM APPLICATIONS
Author(s) -
A. Goyal,
Srimath S. Subasinghe,
Vincent Hood,
Srinivas Tadigadapa
Publication year - 2006
Publication title -
1998 solid-state, actuators, and microsystems workshop technical digest
Language(s) - English
Resource type - Conference proceedings
DOI - 10.31438/trf.hh2006.94
Subject(s) - materials science , surface roughness , etching (microfabrication) , dry etching , inductively coupled plasma , substrate (aquarium) , volumetric flow rate , reactive ion etching , analytical chemistry (journal) , wafer , surface finish , chamber pressure , microelectromechanical systems , composite material , optoelectronics , layer (electronics) , plasma , chemistry , metallurgy , physics , oceanography , quantum mechanics , chromatography , geology
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