Open AccessSILICON-ON-SILICON (SOS): A NEW CMOS COMPATIBLE LOW-TEMPERATURE MEMS PROCESS USING PLASMA ACTIVATED FUSION BONDING
Author(s) -
T. Galchev,
W.C. Welch,
K. Najafi
Publication year - 2006
Language(s) - English
Resource type - Conference proceedings
DOI - 10.31438/trf.hh2006.26
Subject(s) - silicon , microelectromechanical systems , materials science , fusion , plasma , optoelectronics , plasma activation , nanotechnology , linguistics , philosophy , physics , quantum mechanics