Open AccessPROXIMITY MODE INCLINED UV LITHOGRAPHY
Author(s) -
Yong-Kyu Yoon,
Mark G. Allen
Publication year - 2006
Language(s) - Uncategorized
Resource type - Conference proceedings
DOI - 10.31438/trf.hh2006.25
Subject(s) - lithography , immersion lithography , mode (computer interface) , materials science , optoelectronics , extreme ultraviolet lithography , optics , computer science , physics , resist , nanotechnology , human–computer interaction , layer (electronics)