Open AccessPROXIMITY MODE INCLINED UV LITHOGRAPHY
Author(s) -
YongKyu Yoon,
Mark G. Allen
Publication year - 2006
Publication title -
1998 solid-state, actuators, and microsystems workshop technical digest
Language(s) - Uncategorized
Resource type - Conference proceedings
DOI - 10.31438/trf.hh2006.25
Subject(s) - photomask , photoresist , materials science , fabrication , photolithography , lithography , optics , resist , substrate (aquarium) , nozzle , optoelectronics , layer (electronics) , nanotechnology , physics , medicine , oceanography , alternative medicine , pathology , geology , thermodynamics
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