
Fine ZnO Patterning with Controlled Sidewall-Etch-Front Slope
Author(s) -
Jung Eun Kwon,
E.S. Kim
Publication year - 2002
Language(s) - English
Resource type - Conference proceedings
DOI - 10.31438/trf.hh2002.56
Subject(s) - materials science , optoelectronics , etching (microfabrication) , front (military) , nanotechnology , composite material , geology , layer (electronics) , oceanography