Open AccessFine ZnO Patterning with Controlled Sidewall-Etch-Front Slope
Author(s) -
J. W. Kwon,
E.S. Kim
Publication year - 2002
Publication title -
1998 solid-state, actuators, and microsystems workshop technical digest
Language(s) - English
Resource type - Conference proceedings
DOI - 10.31438/trf.hh2002.56
Subject(s) - materials science , etching (microfabrication) , substrate (aquarium) , crystallite , etch pit density , front (military) , optoelectronics , composite material , nanotechnology , metallurgy , layer (electronics) , geology , oceanography
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