Open AccessIn-Situ MicroPlasmas for Rapid Dry Etching of Silicon
Author(s) -
C.G. Wilson,
Yogesh B. Gianchandani
Publication year - 2000
Publication title -
1998 solid-state, actuators, and microsystems workshop technical digest
Language(s) - English
Resource type - Conference proceedings
DOI - 10.31438/trf.hh2000.81
Subject(s) - wafer , torr , etching (microfabrication) , materials science , silicon , reactive ion etching , dry etching , electrode , plasma , plasma etching , power density , optoelectronics , analytical chemistry (journal) , power (physics) , nanotechnology , chemistry , layer (electronics) , physics , quantum mechanics , chromatography , thermodynamics
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