Open AccessHigh Tuning-Ratio MEMS-Based Tunable Capacitors for RF Communications Application
Author(s) -
Jiahui Yao,
Seung-Ha Park,
J.F. DeNatale
Publication year - 1998
Publication title -
1998 solid-state, actuators, and microsystems workshop technical digest
Language(s) - Uncategorized
Resource type - Conference proceedings
DOI - 10.31438/trf.hh1998.28
Subject(s) - capacitor , materials science , microelectromechanical systems , capacitance , optoelectronics , sputtering , etching (microfabrication) , silicon , inductively coupled plasma , radio frequency , electrical engineering , electronic engineering , plasma , thin film , electrode , nanotechnology , engineering , voltage , chemistry , physics , layer (electronics) , quantum mechanics
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