Open AccessEtching Characteristics and Profile Control in a Time Multiplexed Inductively Coupled Plasma Etcher
Author(s) -
Arturo A. Ayón,
Chen-Hao Lin,
Rebecca A. Braff,
M.A. Schmidt
Publication year - 1998
Publication title -
1998 solid-state, actuators, and microsystems workshop technical digest
Language(s) - English
Resource type - Conference proceedings
DOI - 10.31438/trf.hh1998.10
Subject(s) - etching (microfabrication) , reactive ion etching , inductively coupled plasma , photoresist , materials science , plasma etching , optoelectronics , silicon , deep reactive ion etching , dry etching , plasma , analytical chemistry (journal) , nanotechnology , chemistry , physics , layer (electronics) , quantum mechanics , chromatography
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