Open AccessAdvances in Photoresist Based Processing Tools for 3-Dimensional Precision and Micro Mechanics
Author(s) -
H. Guckel,
Pawitter Mangat,
H. Emmerich,
S. Massoud-Ansari,
J. Klein,
J. D. Zook,
T. Ohnstein,
Eric Johnson,
D. P. Siddons,
Todd R. Christenson,
T. Earles
Publication year - 1996
Language(s) - English
Resource type - Conference proceedings
DOI - 10.31438/trf.hh1996.14
Subject(s) - photoresist , computer science , materials science , nanotechnology , layer (electronics)