Open AccessAdvances in Photoresist Based Processing Tools for 3-Dimensional Precision and Micro Mechanics
Author(s) -
H. Guckel,
Pawitter Mangat,
H. Emmerich,
S. Massoud-Ansari,
J. Klein,
J. D. Zook,
T.R. Ohnstein,
E. Diane Johnson,
D. P. Siddons,
Todd R. Christenson,
T. Earles
Publication year - 1996
Publication title -
1998 solid-state, actuators, and microsystems workshop technical digest
Language(s) - English
Resource type - Conference proceedings
DOI - 10.31438/trf.hh1996.14
Subject(s) - photoresist , computer science , lithography , subtractive color , chemical mechanical planarization , mechanical engineering , a priori and a posteriori , nanotechnology , engineering drawing , materials science , engineering , optics , physics , optoelectronics , layer (electronics) , philosophy , epistemology
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