Open AccessApplication of Chemical-Mechanical Polishing to Planarization of Surface-Micromachined Devices
Author(s) -
R.D. Nasby,
James H. Smith
Publication year - 1996
Language(s) - English
Resource type - Conference proceedings
DOI - 10.31438/trf.hh1996.11
Subject(s) - chemical mechanical planarization , microelectromechanical systems , microelectronics , polishing , fabrication , materials science , surface micromachining , integrated circuit , electronic circuit , planar , process (computing) , nanotechnology , electronic engineering , computer science , optoelectronics , electrical engineering , engineering , composite material , medicine , alternative medicine , pathology , computer graphics (images) , operating system