Application of Chemical-Mechanical Polishing to Planarization of Surface-Micromachined Devices
Author(s) -
R.D. Nasby,
J.J. Sniegowski,
James H. Smith,
Stephen Montague,
C.C. Barron,
William P. Eaton,
Dale L. Hetherington,
Christopher A. Apblett,
J. G. Fleming,
P. J. McWhorter
Publication year - 1996
Publication title -
1998 solid-state, actuators, and microsystems workshop technical digest
Language(s) - English
Resource type - Conference proceedings
DOI - 10.31438/trf.hh1996.11
Subject(s) - chemical mechanical planarization , microelectromechanical systems , microelectronics , polishing , fabrication , surface micromachining , materials science , integrated circuit , electronic circuit , planar , electronic engineering , computer science , nanotechnology , optoelectronics , electrical engineering , engineering , composite material , medicine , alternative medicine , computer graphics (images) , pathology
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