Open AccessDEPOSITION TECHNIQUES AND PROPERTIES OF STRAIN COMPENSATED LPCVD SILICON NITRIDE FILMS
Author(s) -
H. Guckel,
D.K. Showers,
D.W. Burns,
C.K. Nesler,
C.R. Rutigliano
Publication year - 1986
Publication title -
1998 solid-state, actuators, and microsystems workshop technical digest
Language(s) - English
Resource type - Conference proceedings
DOI - 10.31438/trf.hh1986.40
Subject(s) - chemical vapor deposition , materials science , silicon nitride , deposition (geology) , silicon , optoelectronics , strain (injury) , nitride , physical vapor deposition , composite material , thin film , nanotechnology , layer (electronics) , geology , medicine , paleontology , sediment
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