Open AccessDEPOSITION TECHNIQUES AND PROPERTIES OF STRAIN COMPENSATED LPCVD SILICON NITRIDE FILMS
Author(s) -
H. Guckel,
D.K. Showers,
D.W. Burns,
C.K. Nesler,
C.R. Rutigliano
Publication year - 1986
Language(s) - English
Resource type - Conference proceedings
DOI - 10.31438/trf.hh1986.40
Subject(s) - chemical vapor deposition , materials science , deposition (geology) , silicon nitride , optoelectronics , strain (injury) , silicon , nitride , electronic engineering , composite material , layer (electronics) , engineering , medicine , paleontology , sediment , biology