Electrochemical etching of isolated structures in p-type silicon
Author(s) -
Joel Bugayong
Publication year - 2010
Language(s) - English
Resource type - Dissertations/theses
DOI - 10.31390/gradschool_theses.4084
Subject(s) - etching (microfabrication) , materials science , silicon , electrochemistry , porosity , isotropic etching , electrolyte , porous silicon , morphology (biology) , anisotropy , nanotechnology , composite material , analytical chemistry (journal) , chemical engineering , optoelectronics , chemistry , electrode , optics , layer (electronics) , chromatography , geology , physics , engineering , paleontology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom