Open AccessPlasma Enhanced Chemical Vapor Deposition of Silicon Nitride and Oxynitride Films Using Disilane as Silicon Source.
Author(s) -
G. Nallapati
Publication year - 1999
Language(s) - English
Resource type - Dissertations/theses
DOI - 10.31390/gradschool_disstheses.6899
Subject(s) - disilane , silicon oxynitride , chemical vapor deposition , silicon nitride , materials science , silicon , analytical chemistry (journal) , plasma enhanced chemical vapor deposition , nitride , thin film , chemistry , nanotechnology , optoelectronics , layer (electronics) , chromatography
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