Open AccessPlasma Enhanced Chemical Vapor Deposition of Silicon Nitride and Oxynitride Films Using Disilane as Silicon Source.
Author(s) -
G. Nallapati
Publication year - 2022
Language(s) - English
Resource type - Dissertations/theses
DOI - 10.31390/gradschool_disstheses.6899
Subject(s) - disilane , silicon oxynitride , chemical vapor deposition , silicon nitride , materials science , silicon , plasma enhanced chemical vapor deposition , analytical chemistry (journal) , thin film , nitride , nanotechnology , chemistry , optoelectronics , layer (electronics) , organic chemistry