Open AccessChemical Vapor Deposition of Copper Films.
Author(s) -
Narendra S. Borgharkar
Publication year - 1997
Language(s) - English
Resource type - Dissertations/theses
DOI - 10.31390/gradschool_disstheses.6559
Subject(s) - torr , copper , deposition (geology) , chemistry , chemical vapor deposition , hydrogen , analytical chemistry (journal) , partial pressure , yield (engineering) , materials science , metallurgy , thermodynamics , organic chemistry , oxygen , paleontology , physics , sediment , biology
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